Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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{| border="1" cellspacing="2" cellpadding="2" colspan="3" | {| border="1" cellspacing="2" cellpadding="2" colspan="3" | ||
|bgcolor="#98FB98" |'''Quality Control (QC) for Aligner: Maskless 01 (MLA1) - Alignment''' | |bgcolor="#98FB98" |'''Quality Control (QC) for Aligner: Maskless 01 (MLA1) - Alignment''' | ||
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{| border="1" cellspacing="1" cellpadding="2" align="center | {| border="1" cellspacing="1" cellpadding="2" align="center" | ||
! QC Recipe: | ! QC Recipe: | ||
! Alignment accuracy test | ! Alignment accuracy test | ||
! QC limits | |||
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|Topside alignment | |Topside alignment | ||
|Expose an overlay design after automatic alignment to 4 alignment marks using the High Res camera and applying scaling and shearing. | | | ||
Expose an overlay design after automatic alignment to 4 alignment marks using the High Res camera and applying scaling and shearing.<br> | |||
Alignment accuracy in 9 points across a 100mm wafer is measured, the average alignment error is reported. | Alignment accuracy in 9 points across a 100mm wafer is measured, the average alignment error is reported. | ||
| Must be better than 1µm | |||
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| align="center" valign="top"| | | align="center" valign="top"| | ||
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