Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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All PolyFabLab materials with sufficient stiffness and flatness. | All PolyFabLab materials with sufficient stiffness and flatness. | ||
<br>Total height variation across the substrate must be less than ±80 µm - including wafer bow | |||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||