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Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
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Mmat (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
1,957 edits
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In LabManager the two furnaces are named "Furnace: LPCVD Poly-Si (4") (B4)" and "Furnace: LPCVD Poly-Si (6") (E2)", respectively.  
In LabManager the two furnaces are named "Furnace: LPCVD Poly-Si (4") (B4)" and "Furnace: LPCVD Poly-Si (6") (E2)", respectively.  


*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Deposition using the 4" Polysilicon Furnace|Deposition of Polysilicon using the 4" Polysilicon Furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 4" polysilicon furnace|Deposition of Polysilicon using the 4" Polysilicon Furnace]]


*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Deposition using the 6" Polysilicon Furnace|Deposition of Polysilicon using the 6" Polysilicon Furnace]]
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 6" polysilicon furnace|Deposition of Polysilicon using the 6" Polysilicon Furnace]]


==Deposition of Silicon using PECVD==
==Deposition of Silicon using PECVD==
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