Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*[[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing#Features|Features]] | *[[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing#Features|Features]] | ||
*[[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing#Alignment|Alignment]] | *[[Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing#Alignment|Alignment]] | ||
===Quality Control (QC)=== | |||
[[Image:section under construction.jpg|70px]] | |||
{| border="1" cellspacing="2" cellpadding="2" colspan="3" | |||
|bgcolor="#98FB98" |'''Quality Control (QC) for Aligner: Maskless 03 (MLA3) - Dose and Defoc''' | |||
|- | |||
| | |||
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=464 The QC procedure for Aligner: Maskless 03 (MLA3)] - '''requires login'''<br> | |||
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=464 The newest QC data for Aligner: Maskless 03 (MLA3)] - '''requires login''' | |||
{| {{table}} | |||
| align="center" | | |||
{| border="1" cellspacing="1" cellpadding="2" align="center" style="width:300px" | |||
! QC Recipe: | |||
! Dose and defocus test on 1.5µm AZ5214E | |||
|- | |||
|Dose test | |||
|Last QC value ± 20 mJ/cm2 (9 steps total) | |||
|- | |||
|Defoc test | |||
|Last QC value ± 8 mJ/cm2 (9 steps total) | |||
|- | |||
|} | |||
| align="center" valign="top"| | |||
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px" | |||
!QC limits | |||
!Aligner: Maskless 03 (MLA3) | |||
|- | |||
|Dose | |||
|none | |||
|- | |||
|Defoc | |||
|none | |||
|- | |||
|} | |||
|- | |||
|} | |||
Dose and defoc values are reported in the QC data sheet. | |||
|} | |||
<br/> | |||
{| border="1" cellspacing="2" cellpadding="2" colspan="3" | |||
|bgcolor="#98FB98" |'''Quality Control (QC) for Aligner: Maskless 03 (MLA3) - Alignment''' | |||
|- | |||
| | |||
*[http://labmanager.dtu.dk/d4Show.php?id=5644&mach=464 The QC procedure for Aligner: Maskless 03 (MLA3)] - '''requires login'''<br> | |||
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=464 The newest QC data for Aligner: Maskless 03 (MLA3)] - '''requires login''' | |||
{| {{table}} | |||
| align="center" | | |||
{| border="1" cellspacing="1" cellpadding="2" align="center" style="width:300px" | |||
! QC Recipe: | |||
! Alignment accuracy test | |||
|- | |||
|Topside alignment | |||
|Expose an overlay design after automatic alignment to 4 alignment marks using the High Res camera and applying scaling and shearing. | |||
Alignment accuracy in 9 points across a 100mm wafer is measured, the average alignment error is reported. | |||
|- | |||
|Backside alignment | |||
|Expose an overlay design after automatic alignment to 4 backside alignment marks and applying scaling and shearing. Rotate the wafer 180° and repeat. | |||
Alignment accuracy in 9 points across a 100mm wafer is measured, half the average alignment error is reported. | |||
|- | |||
|} | |||
| align="center" valign="top"| | |||
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px" | |||
!QC limits | |||
!Aligner: Maskless 03 (MLA3) | |||
|- | |||
|Topside alignment error | |||
|>0.5µm | |||
|- | |||
|Topside alignment error | |||
|>1µm | |||
|- | |||
|} | |||
|- | |||
|} | |||
Camera offsets will be adjusted if alignment error is outside the limit. | |||
|} | |||
<br/> | |||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||