Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 ! QC Recipe:
-! Dose and defocus test on 1.5µm AZ5214E
+! Alignment accuracy test
 |-
-|Dose test
+|Topside alignment
-|Last QC value ± 20 mJ/cm2 (9 steps total)
+|Expose an overlay design after automatic alignment to 4 alignment marks using the High Res camera and applying scaling and shearing.
+Alignment accuracy in 9 points across a 100mm wafer is measured, the average alignment error is reported.
 |-
-|Defoc test
+|Backside alignment
-|Last QC value ± 8 mJ/cm2 (9 steps total)
+|Expose an overlay design after automatic alignment to 4 backside alignment marks and applying scaling and shearing. Rotate the wafer 180° and repeat.
+Alignment accuracy in 9 points across a 100mm wafer is measured, half the average alignment error is reported.
 |-
 |}