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Specific Process Knowledge/Lithography/Development: Difference between revisions

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===Standard manual beaker development procedure===
===Standard manual beaker development procedure===
[[File:Beaker_development_v1.png|600px|thumb|Standard procedure for manual beaker development in fume hood:<br>1) Submerge exposed substrate into development solution<br>2) When timer ends, move substrate directly into Rinse 1<br>3) After a few seconds, move substrate into Rinse 2<br>4) Remove developed substrate for drying|right]]
[[File:Beaker_development_v1.png|600px|thumb|Standard procedure for manual beaker development in fume hood:<br>1) Submerge exposed substrate into development solution<br>2) When timer ends, move substrate directly into Rinse 1<br>3) After a few seconds, move substrate into Rinse 2*<br>4) Remove developed substrate for drying<br>*It is allowed to omit the Rinse 2 step|right]]
The standard procedure for manual beaker development in a fume hood is as follows:
The standard procedure for manual beaker development in a fume hood is as follows:
#Prepare development process
#Prepare development process
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*Find a timer - make sure it works as you expect it to, before submerging your substrate into the development solution and discovering that the timer is in fact broken
*Find a timer - make sure it works as you expect it to, before submerging your substrate into the development solution and discovering that the timer is in fact broken
*Get some cleanroom wipes and keep them nearby, for wiping any drops spilled during handling
*Get some cleanroom wipes and keep them nearby, for wiping any drops spilled during handling
*<span style="color:red">Do not cover too many of the exhaust holes in the fume hood table, as this will reduce the efficiency of the exhaust, which reduces safety</span>
*<span style="color:red">Do not place your beakers too close to the fume hood sash, as this can make it difficult to efficiently extract the fumes escaping from the beakers, which reduces safety</span>


'''Perform development'''
'''Perform development'''
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#Submerge it immediately into Rinse 1
#Submerge it immediately into Rinse 1
#Agitate up/down for at least a few seconds
#Agitate up/down for at least a few seconds
#Move substrate into Rinse 2
#Move substrate into Rinse 2*
#Agitate slightly
#Agitate slightly
#The developed substrate can now be removed and dried
#The developed substrate can now be removed and dried
<nowiki>*</nowiki>It is allowed to omit the Rinse 2 step


'''Clean up'''
'''Clean up'''