Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 03|Aligner: Maskless 03]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 03|Aligner: Maskless 03]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 04|Aligner: Maskless 04]]</b> | |||
<!--|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b>--> | <!--|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b>--> | ||
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*Back Side Alignment | *Back Side Alignment | ||
*Maskless UV exposure | *Maskless UV exposure | ||
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*Top Side Alignment | |||
*Maskless UV exposure | |||
*Direct laser writing | |||
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*UV exposure | *UV exposure | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | ||
|style="background:LightGrey; color:black"|Minimum feature size | |style="background:LightGrey; color:black"|Minimum feature size | ||
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~1 µm | |||
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~1 µm | ~1 µm | ||
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405nm laserdiodes | 405nm laserdiodes | ||
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*365nm LED | |||
*405nm diode laser | |||
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*1000 W Hg-Xe lamp | *1000 W Hg-Xe lamp | ||
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*Projection: | *Projection: | ||
**Pneumatic auto-focus | |||
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*Projection: | |||
**Optical auto-focus | |||
**Pneumatic auto-focus | |||
*Direct laser writing: | |||
**Optical auto-focus | |||
**Pneumatic auto-focus | **Pneumatic auto-focus | ||
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*1 small sample, down to 5x5 mm<sup>2</sup> | *1 small sample, down to 5x5 mm<sup>2</sup> | ||
*1 50 mm wafer | |||
*1 100 mm wafer | |||
*1 150 mm wafer | |||
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*1 small sample, down to 3x3 mm<sup>2</sup> | |||
*1 50 mm wafer | *1 50 mm wafer | ||
*1 100 mm wafer | *1 100 mm wafer | ||
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*All cleanroom materials | *All cleanroom materials | ||
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*All PolyFabLab materials | |||
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*All cleanroom materials--> | *All cleanroom materials--> | ||