Specific Process Knowledge/Lithography/Development: Difference between revisions
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==Developer: E-beam== | ==Developer: E-beam 02== | ||
[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam is located in E-4]] | [[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam 02 is located in E-4]] | ||
Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment. | Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment. | ||