Specific Process Knowledge/Lithography/Development: Difference between revisions
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==Developer: TMAH Manual== | ==Developer: TMAH Manual 02== | ||
[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: TMAH Manual is located in E-4]] | [[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: TMAH Manual 02 is located in E-4]] | ||
Developer: TMAH Manual is a manually operated, single substrate or chip puddle developer. It uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in water with a small amount of wetting agent). The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | Developer: TMAH Manual 02 is a manually operated, single substrate or chip puddle developer. It uses the TMAH based AZ 726 MIF developer (2.38 % TMAH in water with a small amount of wetting agent). The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, water rinse, and drying is performed automatically by the equipment. | ||