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Specific Process Knowledge/Lithography/Development: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam is located in E-4]]
[[Image:IMG 2464.JPG|300×300px|right|thumb|Developer: E-beam is located in E-4]]


Developer: E-beam is a manually operated, single substrate or chip spray-puddle developer. It uses the N50 or AR 600-546 developers and IPA for rinsing. The substrates or chips are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is performed automatically by the equipment.
Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment.
 
The machine is setup to agitate and be stationary to enhance the development uniformity - this is a ongoing process.


'''[https://www.youtube.com/watch?v=btinNzYnLnY Training video]''' (for Developer: TMAH Manual, but it is the same model)
'''[https://www.youtube.com/watch?v=btinNzYnLnY Training video]''' (for Developer: TMAH Manual, but it is the same model)
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===Process information===
===Process information===
All recipes use the following structure:
#Pressurize the developer canister
#Dispense puddle while rotating substrate slowly
#Puddle development while not rotating
#Agitate substrate once per 15 seconds by rotating slowly for 1 second
#Spin off developer
#Clean substrate with IPA
#Dry substrate and chamber with nitrogen


All recipes are single puddle.
Multi-puddle recipes repeat steps 2-5 for the given number of puddles.
N50 and 546 denotes the developer used (546 is short for AR 600- 546).
The first step is pressurizing the canister so nothing will happen visually.
Please watch if the developer and rinsing starts. If not try to restart the machine by pressing the EMO and turning it on again.
The spray is 8-10 s and will start the development process hence the short recipes (10s and 30s.) have been adjusted according to this.


'''Process recipes'''
*546 10s: 10s. Development Rinse and dry.
*546 30s: 60s. Development Rinse and dry.
*546 60s: 60s. Development Rinse and dry.
*546 180s: 180s. Development Rinse and dry.
*N50 10s: 10s. Development Rinse and dry.
*N50 30s: 30s. Development Rinse and dry.
*N50 60s: 60s. Development Rinse and dry.
*N50 90s: 90s. Development Rinse and dry.
*N50 120s: 120s. Development Rinse and dry.
*N50 180s: 180s. Development Rinse and dry.
*N50 300s: 300s. Development Rinse and dry.
*N50 180s6": Test for changing the agitation for 6" uniformity 180s. Development Rinse and dry.
*Testdev: The time can be modified 60s. Development Rinse and dry on AR 600-546.
*Rinse: Rinse and dry.


'''Utility recipes'''
'''Process recipes'''<br>
*UTIL-DR: Dome rinse.
N50 recipes have the letter "N" in them. AR-600-50 recipes have the letter "A"  in them. The number is the development time in seconds:
*UTIL-BE: Bottle empty. Nanolab use only.
*01 Rinse
*02 N 15
*03 N 30
*04 N 60
*05 N 90
*06 N 120
*07 N 180
*08 N 300
*09 N 600
*10 N 2x60
*11 N 5x60
*12 A 15
*13 A 30
*14 A 60
*15 A 90
*16 A 120
*17 A 180
*18 A 300
*19 A 600
*20 A 2x60
*21 A 5x60


=== Equipment performance and process related parameters ===
=== Equipment performance and process related parameters ===
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