Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |||
|'''ma-N 2400''' | |||
|Negative | |||
|[https://www.microresist.de/en/produkt/ma-n-2400-series/ Micro Resist Technology] | |||
|[[]] | |||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |||
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|Anisol | |||
|ma-D 525 | |||
|H2O | |||
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