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| |-style="background:WhiteSmoke; color:black"
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| |'''[[Specific_Process_Knowledge/Lithography/ARN7500|AR-N 7500]]'''
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| |Negative
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| |[http://www.allresist.com AllResist]
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| |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 info]
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| |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]]
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| |a = 17126, b = -0.435
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| |PGMEA
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| *AR 300-47:DIW (4:1)
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| *MIF726:DIW (8:5)
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| |DIW
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| *AR 300-73
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| *O2 plasma
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| |} | | |} |
