Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
| Line 257: | Line 257: | ||
| 2018 | | 2018 | ||
| 0.8 | | 0.8 | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|AR-P 8200.06 | |||
| 0.1 L | |||
| 2021 | |||
| 0.1 | |||
|} | |} | ||
| Line 257: | Line 257: | ||
| 2018 | | 2018 | ||
| 0.8 | | 0.8 | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|AR-P 8200.06 | |||
| 0.1 L | |||
| 2021 | |||
| 0.1 | |||
|} | |} | ||