Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 02|Aligner: Maskless 02]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 03|Aligner: Maskless 03]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner: Maskless 03|Aligner: Maskless 03]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b> | <!--|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/UVExposure#Inclined UV Lamp|Inclined UV Lamp]]</b>--> | ||
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*Back Side Alignment | *Back Side Alignment | ||
*Maskless UV exposure | *Maskless UV exposure | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
*UV exposure | *UV exposure | ||
*DUV exposure | *DUV exposure--> | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
~1 µm | ~1 µm | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"|--> | ||
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|style="background:LightGrey; color:black"|Exposure light/filters/spectrum | |style="background:LightGrey; color:black"|Exposure light/filters/spectrum | ||
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405nm laserdiodes | 405nm laserdiodes | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
*1000 W Hg-Xe lamp | *1000 W Hg-Xe lamp | ||
*Dichroic mirror: | *Dichroic mirror: | ||
**Near UV (350-450nm) | **Near UV (350-450nm) | ||
**Mid UV (260-320nm) | **Mid UV (260-320nm) | ||
**Deep UV (220-260nm) | **Deep UV (220-260nm)--> | ||
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*Projection: | *Projection: | ||
**Pneumatic auto-focus | **Pneumatic auto-focus | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
*Flood exposure | *Flood exposure | ||
*Proximity exposure with home-made chuck and maskholder | *Proximity exposure with home-made chuck and maskholder | ||
*Inclined exposure | *Inclined exposure | ||
*Rotating exposure | *Rotating exposure--> | ||
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*1 100 mm wafer | *1 100 mm wafer | ||
*1 150 mm wafer | *1 150 mm wafer | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
*all sizes up to 8inch | *all sizes up to 8inch--> | ||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All cleanroom materials | *All cleanroom materials | ||
|style="background:WhiteSmoke; color:black"| | <!--|style="background:WhiteSmoke; color:black"| | ||
*All cleanroom materials | *All cleanroom materials--> | ||
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|} | |} | ||