Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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*[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/SiO2 deposition using ALD2|Deposition of Silicon Oxide using ALD2]] | *[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/SiO2 deposition using ALD2|Deposition of Silicon Oxide using ALD2]] | ||
== | ==Wet SiO2 growth == | ||
[https://labmanager.dtu.dk/view_binary.php?class=ChemicalProcess&id=118&name=Updated_APV_Wet_SiO2-growth_using_HNO3+%281%29.docx | [https://labmanager.dtu.dk/view_binary.php?class=ChemicalProcess&id=118&name=Updated_APV_Wet_SiO2-growth_using_HNO3+%281%29.docx Link to riskassessment and procedure in Labmanager (password needed)] | ||
==Comparison of the methods for deposition of Silicon Oxide== | ==Comparison of the methods for deposition of Silicon Oxide== | ||