Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
| Line 23: | Line 23: | ||
*[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/SiO2 deposition using ALD2|Deposition of Silicon Oxide using ALD2]] | *[[Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/SiO2 deposition using ALD2|Deposition of Silicon Oxide using ALD2]] | ||
==gkkj== | |||
[https://labmanager.dtu.dk/view_binary.php?class=ChemicalProcess&id=118&name=Updated_APV_Wet_SiO2-growth_using_HNO3+%281%29.docx] | |||
==Comparison of the methods for deposition of Silicon Oxide== | ==Comparison of the methods for deposition of Silicon Oxide== | ||