Specific Process Knowledge/Lithography/SU-8: Difference between revisions
Appearance
| Line 46: | Line 46: | ||
'''Spin curves:''' | '''Spin curves:''' | ||
Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner): [[ | Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner): | ||
[[File:SU8 spinCurves 2002 2005.png|640px|thumb|right|Spin curves for SU-8 2002 and SU-8 2005.]] | |||
* A rotation cover (Gyrset) can be also used in case you need to spin less than 1 um resist film | * A rotation cover (Gyrset) can be also used in case you need to spin less than 1 um resist film | ||
** 3000 rpm, 300 rpm/s, 30 sec with gyrset gives approximately 850 nm film thickness, when using SU-8 2002 | ** 3000 rpm, 300 rpm/s, 30 sec with gyrset gives approximately 850 nm film thickness, when using SU-8 2002 | ||