Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
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*TiO<sub>2</sub>: 0.041 - 0.061 nm/cycle (Using the "TiO2" recipe, depending on temperature) | *TiO<sub>2</sub>: 0.041 - 0.061 nm/cycle (Using the "TiO2" recipe, depending on temperature) | ||
*ZnO: 0.11 - 0.18 nm/cycle (Using ZnOT recipe, depending on temperature) | *ZnO: 0.11 - 0.18 nm/cycle (Using ZnOT recipe, depending on temperature) | ||
*HfO<sub>2</sub>: 0. | *HfO<sub>2</sub>: 0.0827 nm/cycle | ||
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|style="background:LightGrey; color:black"|Thickness | |style="background:LightGrey; color:black"|Thickness | ||