Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*High Aspect Ratio Mode for exposure of thick resists | *High Aspect Ratio Mode for exposure of thick resists | ||
*Upgrade to 8" (stage and exposure area) | *Upgrade to 8" (stage and exposure area) | ||
'''[https://www.youtube.com/playlist?list=PLjWVU97LayHAiCabstMfAUeeWyQoQI_cV Training videos]''' | |||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=440 LabManager] | Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=440 LabManager] | ||