Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs: Difference between revisions
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== InP etch with Cl2/H2 and a Si carrier wafer (2019) | == InP etch with Cl2/H2 and a Si carrier wafer (2019) == | ||
''Work done by Berit Herstrøm @Nanolab spring 2019'' | ''Work done by Berit Herstrøm @Nanolab spring 2019'' | ||
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