Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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*N<sub>2</sub>:0-3000 sccm | *N<sub>2</sub>:0-3000 sccm | ||
*GeH<sub>4</sub>:0-6.00 sccm | *GeH<sub>4</sub>:0-6.00 sccm | ||
*5%PH<sub>3</sub>:0- | *5%PH<sub>3</sub>:0-60 sccm | ||
*3%B<sub>2</sub>H<sub>6</sub>:0-1000 sccm | *3%B<sub>2</sub>H<sub>6</sub>:0-1000 sccm | ||
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