Specific Process Knowledge/Thin film deposition/Sputter coater: Difference between revisions

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VisualWikitext

@@ Line 142: / Line 142: @@
 !style="background:silver; color:black;" align="left"|Purpose
 |style="background:LightGrey; color:black"| ||style="background:WhiteSmoke; color:black"|
-*Gold sputter coating of different samples mainly before SEM characterization (see purpose)
+*Gold sputter coating of different samples before SEM characterization
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
 |style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"|
-*10 Å - > 25 nm
+*Not measured. The maximum allowed sputter time is 30 s
 |-
 |style="background:LightGrey; color:black"|Deposition rate
@@ Line 152: / Line 152: @@
 *Not measured
 |-
-!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Process parameter range
+|style="background:LightGrey; color:black"|Process pressure
-|style="background:LightGrey; color:black"|Process Temperature
 |style="background:WhiteSmoke; color:black"|
-*Room temperature
+*0.01 mbar
 |-
-|style="background:LightGrey; color:black"|Process pressure
+!style="background:silver; color:black;" align="left"|Purpose
-|style="background:WhiteSmoke; color:black"|
+|style="background:LightGrey; color:black"| ||style="background:WhiteSmoke; color:black"|
-*5*10<sup> -2</sup> mbar
+*Gold sputter coating of different samples before SEM characterization
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates
@@ Line 169: / Line 168: @@
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black"|
-*All materials allowed in the cleanroom
+*All samples that are allowed in the SEM Supra 1
-*Samples from outside the cleanroom, including biological samples
 |-
 |-
 |}