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Specific Process Knowledge/Lithography/Strip: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 153: Line 153:
|-
|-
|'''Process gases'''
|'''Process gases'''
|O<sub>2</sub>, N<sub>2</sub>
|
|O<sub>2</sub> or O<sub>2</sub>/N<sub>2</sub> mixture
*O<sub>2</sub> (400 sccm)
*N<sub>2</sub> (0-70 sccm)
|
*O<sub>2</sub> (70-201 sccm)
*N<sub>2</sub> (0-70 sccm)
|O<sub>2</sub>, CF<sub>4</sub>, N<sub>2</sub> or their mixtures
|O<sub>2</sub>, CF<sub>4</sub>, N<sub>2</sub> or their mixtures
|O<sub>2</sub>
|O<sub>2</sub>
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