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Specific Process Knowledge/Lithography/Strip: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Line 47: Line 47:
*CF<sub>4</sub>
*CF<sub>4</sub>
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*O<sub>2</sub>
*O<sub>2</sub> (0 - 400 sccm)
*N<sub>2</sub>
*N<sub>2</sub>
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*O<sub>2</sub>
*O<sub>2</sub> (flow unknown)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*NA
*NA
Line 63: Line 63:
*1000 W
*1000 W
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*100%
*100% (power unknown)
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*NA
*NA
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