Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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|Low Presure Chemical Vapor Deposition TEOS gives a good quality SiO2 and is a batch process. | |Low Presure Chemical Vapor Deposition TEOS gives a good quality SiO2 and is a batch process. | ||
|Plasma Enhanced Chemical Vapor Deposition has the advantach that a silicon oxide and be deposited with a quit high deposition rate at a rather low temperature. | |Plasma Enhanced Chemical Vapor Deposition has the advantach that a silicon oxide and be deposited with a quit high deposition rate at a rather low temperature. | ||
|Sputter deposition | |Sputter deposition: can be done ontop of a large range of materials | ||
| | |Sputter deposition: can be done ontop of a large range of materials | ||
|Sputter deposition | |Sputter deposition: can be done ontop of a large range of materials | ||
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