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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions

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!3
!Film Quality
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*SiO<sub>2</sub>
*Less than thermal oxide. Annealing makes it more dense.
Can be doped with boron
*Few defects
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*Si<sub>x</sub>O<sub>y</sub>H<sub>z</sub>
*Less dense film
Can be doped with boron, phosphorus or germanium
*Incorporation of hydrogen in the film
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*Not measured (a sputter target with stoichiometry SiO<sub>2</sub> is used)
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*Not measured (a sputter target with stoichiometry SiO<sub>2</sub> is used
*
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*
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