Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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[[Image:image.JPG|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | [[Image:image.JPG|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | ||
A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide | A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphor after a pre-deposition. Phospher pre-deposition takes place in the A4 Furnace phosphorus pre-dep. A3 can also be used for drive in of phosphor which has been ion implanted. | ||
A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | A3 is the third furnace tube in the A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | ||
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'''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' | |||
Equipment info in [http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&page_id=169 Phosphor Drive-in] | |||
==Process knowledge== | ==Process knowledge== | ||