Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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=Mask vs Maskless aligners= | |||
[[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA]] | |||
=Decommisioned tools= | =Decommisioned tools= | ||
Revision as of 10:14, 25 June 2026
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UV Exposure Comparison Table
| Equipment | Aligner: MA6-1 | Aligner: MA6-2 | Aligner: Maskless 01 | Aligner: Maskless 02 | Aligner: Maskless 03 | Aligner: Maskless 04 | |
|---|---|---|---|---|---|---|---|
| Purpose |
OBS: this tool is in PolyFabLab |
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OBS: this tool is in PolyFabLab | |
| Performance | Minimum feature size |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
~1 µm |
| Alignment accuracy |
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±2 µm |
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±1 µm | |
| Exposure light |
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365nm LED |
375nm laser diode array |
405nm laser diode array |
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| Exposure mode |
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| Substrates | Batch size |
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| Allowed materials |
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Mask vs Maskless aligners
Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA
Decommisioned tools
Inclined UV lamp was decommissioned 2023.