Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:LightGrey; color:black"|Alignment modes | |style="background:LightGrey; color:black"|Alignment modes | ||
|style="background:WhiteSmoke; color:black" colspan="2"| | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*Top side alignment | *Top side alignment, ±0.5µm | ||
*Backside alignment | *Backside alignment, ±1.0µm | ||
*Field alignment (chip-by-chip TSA) | *Field alignment (chip-by-chip TSA), ±0.25µm (within 5x5mm<sup>2</sup> area) | ||
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