Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | ||
[[Category: Equipment|Thin film PECVD]] | [[index.php?title=Category:Equipment|Thin film PECVD]] | ||
[[Category: Thin Film Deposition|PECVD]] | [[index.php?title=Category:Thin Film Deposition|PECVD]] | ||
==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||
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*[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | *[[/Pre-release tests on PECVD4|Pre-release tests on PECVD4]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si deposition using PECVD|Si deposition using PECVD3]]<br /> | ||
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==Overview of the performance of PECVD thin films and some process related parameters== | ==Overview of the performance of PECVD thin films and some process related parameters== | ||