Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

@@ Line 282: / Line 282: @@
 | style="background:LightGrey; color:black"|Exposure light/filters
 |style="background:WhiteSmoke; color:black" colspan="2"|
-*broadband (i-, g-, h-line)
 *365 nm (i-line)
-*303 nm
+*broadband (i-, g-, h-line), requires tool change
+*(303 nm, requires tool change)
 |-
 |style="background:LightGrey; color:black"|Minimum structure size
@@ Line 293: / Line 293: @@
 |style="background:WhiteSmoke; color:black" colspan="2"|
 *5x5 inch
-*7x7 inch
-*special holder for 4 x 2" designs on 5x5 inch
 |-
 |style="background:LightGrey; color:black"|Alignment modes
@@ Line 304: / Line 302: @@
 |style="background:LightGrey; color:black"|Substrate size
 |style="background:WhiteSmoke; color:black" colspan="2"|
-* small pieces 1x1cm
+Mask exposure and alignment:
-* 50 mm wafers
 * 100 mm wafers
-* 150 mm wafers
+Flood exposure:
+* samples up to 150 mm wafers
 |-
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black" colspan="2"|
-All cleanroom materials
+All PolyFabLab materials
-Dedicated chuck for III-V materials
 |-
 |style="background:LightGrey; color:black"|Batch