Specific Process Knowledge/Lithography/Development: Difference between revisions
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*Pour Rinse 1 and Rinse 2 into appropriate waste: water goes into the sink, IPA goes into C-waste drain | *Pour Rinse 1 and Rinse 2 into appropriate waste: water goes into the sink, IPA goes into C-waste drain | ||
*Rinse beakers with the DI-water gun | *Rinse beakers with the DI-water gun | ||
*Pour development solution into appropriate waste: solvent based developer goes into C-waste drain. NB! TMAH is an aqueous alkaline solution, which must never be mixed with solvents! TMAH waste goes into the dedicated TMAH waste container, stored in the chemical cabinet in E-4. | *Pour development solution into appropriate waste: solvent based developer goes into C-waste drain. <span style="color:red">NB! TMAH is an aqueous alkaline solution, which must never be mixed with solvents! TMAH waste goes into the dedicated TMAH waste container, stored in the chemical cabinet in E-4.</span> | ||
*If your developer solution is not TMAH based: | *If your developer solution is not TMAH based: | ||
** | **Rinse beaker 3 times, discard water into sink | ||
*If your developer solution is TMAH based: | *If your developer solution is TMAH based: | ||
** | **Rinse beaker once with DI-water and discard this into the TMAH waste | ||
**Rinse beaker two more times, discarding the water into the sink | **Rinse beaker two more times, discarding the water into the sink | ||
*Hang all beakers to dry on the drying rack | *Hang all beakers to dry on the drying rack | ||