Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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3.) Development of nLOF | 3.) Development of nLOF | ||
'''4.) 5 min descum (70 ml/min O2, 70 ml/min N2, 150W, 5 min) was done right before TiAu deposition''' | '''4.) 5 min descum (70 ml/min O2, 70 ml/min N2, 150W, 5 min in Plasma Asher 1) was done right before TiAu deposition''' | ||
5.) 10 nm Ti depositing with 2 A/s by Temescal | 5.) 10 nm Ti depositing with 2 A/s by Temescal | ||