Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
| Line 8: | Line 8: | ||
''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
|- | |||
| [[image:SingleShot1.png|400px]] || [[image:SingleShot3.png|400px]] || [[image:SingleShot3.png|400px]] | |||
|- | |||
| colspan="3" style="text-align:center;| | |||
Bla | |||
|} | |||
=Article on quality control on the JEOL 9500 system= | =Article on quality control on the JEOL 9500 system= | ||
''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ||