Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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*[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | *[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | ||
Formerly we also had the possibility sputter silicon oxide using the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]. You can read more about that [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2 | Formerly we also had the possibility sputter silicon oxide using the [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE Ionfab300]]. You can read more about that [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|here]]. | ||
==Deposition of Silicon Oxide using ALD== | ==Deposition of Silicon Oxide using ALD== | ||