Specific Process Knowledge/Lithography/Development: Difference between revisions
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[[Image:SU-8developer.jpg|300x300px|right|thumb|The SU8-Developer bench is located in C-1]] | [[Image:SU-8developer.jpg|300x300px|right|thumb|The SU8-Developer bench is located in C-1]] | ||
The SU8-Developer bench is a manually operated | The SU8-Developer bench is a manually operated wet bench for submersion development of SU-8 photoresist in PGMEA (supplied in the cleanroom as mr-Dev 600). The development process is in two stages; one bath (FIRST) to dissolve the bulk of the resist, and a second, cleaner bath (FINAL) to finish the development. The development time is controlled manually by the user. After development, the substrates are rinsed with IPA in dedicated IPA bath and put for drying in the empty bath. | ||
The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach= | The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=169 LabManager: Developer: SU8(Wet Bench)] - '''requires login''' | ||
===Process information=== | ===Process information=== | ||
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*100 mm wafers | *100 mm wafers | ||
*150 mm wafer | *150 mm wafers, check the liquid level in the baths | ||
*200 mm wafer, check the liquid level in the baths | |||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||