Specific Process Knowledge/Lithography/Mix-and-match: Difference between revisions
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===Contrast curve=== | ===Contrast curve=== | ||
A contrast curve is generated using the parameters described above. The contrast is estimated to be 0.75. The low contrast will limit the possibility of using it for dense and low CD geometry. | A contrast curve is generated using the parameters described above. The contrast is estimated to be 0.75. The low contrast will limit the possibility of using it for dense and low CD geometry. | ||
{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | |||
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| [[image:250nmnlof.png|800px]] | |||
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250 nm nLOF2020 contrast curve from exposure at 100 kV on JEOL 9500. Image: Thomas Pedersen. | |||
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===Example images=== | ===Example images=== | ||