Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 216: Line 216:


===Current EBL resist stock===
===Current EBL resist stock===
The table below indicates the current stock of Nanolab provided EBL resists in the resist cupboard in E4.


{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="40%"
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="40%"
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/EBLsubstratePrep"