Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
Appearance
No edit summary |
|||
| Line 26: | Line 26: | ||
'''[https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs&page_id=387 Furnace computer manual]''' | '''[https://labmanager.dtu.dk/function.php?module=MiscDocument&view=docs&page_id=387 Furnace computer manual]''' | ||
== Manual for the furnace computer to the A, B, C and E stack furnaces == | == Manual for the furnace computer to the A, B, C and E stack furnaces == | ||