Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

@@ Line 67: / Line 67: @@
 |style="background:WhiteSmoke; color:black"|
 *350W Hg lamp
-*i-line filter (365nm notch filter), intensity in Constant Intensity mode: 8mW/cm<sup>2</sup> @ 365nm
+*i-line filter (365nm notch filter)<br>Intensity in Constant Intensity mode:<br>8mW/cm<sup>2</sup> @ 365nm
 *303nm filter optional
 |style="background:WhiteSmoke; color:black"|
 *500W Hg-Xe lamp
-*i-line filter (365nm notch filter), intensity in Constant Intensity mode: 11mW/cm<sup>2</sup> @ 365nm
+*i-line filter (365nm notch filter)<br>Intensity in Constant Intensity mode:<br>11mW/cm<sup>2</sup> @ 365nm
 *UV350 optics optional
 *UV250 optics optional
@@ Line 82: / Line 82: @@
 |style="background:WhiteSmoke; color:black"|
 *1000 W Hg-Xe lamp
-*near UV (350-450nm), mid UV (260-320nm), and deep UV (220-260nm)
+*Dichroic mirror:
+**Near UV (350-450nm)
+**Mid UV (260-320nm)
+**Deep UV (220-260nm)
 |-