Jump to content

Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Line 121: Line 121:


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|'''Lift-off'''
|style="background:WhiteSmoke; color:black"; align="center";|'''Lift-off'''
|-
|-
!style="background:silver; color:black;" |Purpose  
!style="background:silver; color:black;"|Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Lift-off using UV resists, e.g.
*Lift-off of UV or E-beam resist
** AZ 5214E lift-off
** AZ nLOF lift-off
*Lift-off using e-beam resists, e.g.
** CSAR 62
*Resist strip of wafers with metal
*Resist strip of wafers with metal
|-
|-
Line 136: Line 132:
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
NMP (Remover 1165) / Rinse in IPA
*NMP (Remover 1165)
*Rinse in IPA
|-
|-
!style="background:silver; color:black" valign="center" rowspan="2"|Process parameters
!style="background:silver; color:black" valign="center" rowspan="2"|Process parameters
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/LiftOff"