Jump to content

Specific Process Knowledge/Lithography/Development: Difference between revisions

Jehem (talk | contribs)
Jehem (talk | contribs)
Line 498: Line 498:
!style="background:silver; color:black;" align="center" width="60"|Purpose  
!style="background:silver; color:black;" align="center" width="60"|Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Development of
Development of:
*CSAR
*CSAR
*ZEP520A
*ZEP520A


|-
|-
!style="background:silver; color:black;" align="center" width="60"|Developer  
!style="background:silver; color:black;" align="center" width="60"|Developer  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
*AR 600 - 546 (developer X AR 600-54/6) used for CSAR 6200 series
*AR 600 - 546 (developer X AR 600-54/6) used for CSAR 6200 series resists
*ZED N-50 used for Zep520A resists
*ZED N-50 used for Zep520A resists
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
|style="background:LightGrey; color:black"|Development
|style="background:LightGrey; color:black"|Development
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Spray/Puddle
Spray/Puddle
|-
|-
|style="background:LightGrey; color:black"|Handling
|style="background:LightGrey; color:black"|Handling
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Vacuum chuck for 2",4" or 6" wafers and chip "basket"
*Vacuum chuck for 100 mm or 150 mm wafers
*Chip chick for chips and 2" wafers
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
|style="background:LightGrey; color:black"|Temperature
|style="background:LightGrey; color:black"|Temperature
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Room temperature
Room temperature
|-
|-
|style="background:LightGrey; color:black"|Agitation
|style="background:LightGrey; color:black"|Agitation
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
Yes 15rpm back and forth
Yes: Rotational agitation at 15 rpm
|-
|-
|style="background:LightGrey; color:black"|Rinse
|style="background:LightGrey; color:black"|Rinse
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
IPA - Isopropanol
IPA
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
* Chips (6-60 mm)
* Chips (6-60 mm)
* 50 mm wafers
* 2" wafers
* 100 mm wafers
* 100 mm wafers
* 150 mm wafers
* 150 mm wafers
|-
|-
| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
All cleanroom approved materials  
All cleanroom approved materials  


Line 549: Line 548:
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center"|
|style="background:WhiteSmoke; color:black"|
1  
1  
|-  
|-