Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

Revision as of 12:46, 27 January 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,915 edits →KS Aligner ← Older edit		Revision as of 09:48, 30 January 2023 view source Jehem (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip 1,915 edits →Aligner: MA6 - 2 Newer edit →
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	The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns.		The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns.

	*[[Specific Process Knowledge/Lithography/~~UVExposure_Dose~~\|Information on UV exposure dose]]		*[[Specific Process Knowledge/Lithography/Resist#Aligner:_MA6_-_2\|Information on UV exposure dose]]