Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 205: | Line 205: | ||
Kept power setting constant at Power: 100% and vary oxydgen flow during process. | Kept power setting constant at Power: 100% and vary oxydgen flow during process. | ||
[[image:AZMIR701_pressure_settings.png| | [[image:AZMIR701_pressure_settings.png|right|frame|400x400px| Descum results for different pressure settings]] | ||
| Line 223: | Line 222: | ||
|} | |} | ||
'''Ashing of AZ5214E resist''' | '''Ashing of AZ5214E resist''' | ||