Specific Process Knowledge/Lithography/Descum: Difference between revisions
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===[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Strip#Plasma_asher Plasma asher 1]=== | ===[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Strip#Plasma_asher Plasma asher 1]=== | ||
[[image:Descum Results aug 2019.png|right|frame|400x400px| Descum results plasma asher 1]] | [[image:Descum Results aug 2019.png|right|frame|400x400px| Descum results plasma asher 1. September 2019]] | ||
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Conny Hjort & Jesper Hanberg | Conny Hjort & Jesper Hanberg | ||
September 2019 | September 2019 | ||
[[image:PA1_descum.jpg|right|frame|400x400px| Different resist descum results plasma asher 1. August 2021]] | |||
Descum of different resists, AZ5214E, AZ701 MiR and AZ2020 nLOF, on a single 100mm wafer was tested. Wafer was placed vertically in the middle of glass carrier. | Descum of different resists, AZ5214E, AZ701 MiR and AZ2020 nLOF, on a single 100mm wafer was tested. Wafer was placed vertically in the middle of glass carrier. | ||