Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
| Line 15: | Line 15: | ||
sputter system. One of the advantages here is that you can deposit on many kinds of material. | sputter system. One of the advantages here is that you can deposit on many kinds of material. | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Reactivly sputtered SiO2 in Sputter-System Metal Oxide (PC1)|Reactively | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Reactivly sputtered SiO2 in Sputter-System Metal Oxide (PC1)|Reactively Sputtered Silicon Oxide in Sputter-System Metal Oxide (PC1)]] | ||
*[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | *[[/Deposition of Silicon Oxide using Lesker sputter tool|Deposition of Silicon Oxide using Lesker sputter tool]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of Silicon Oxide using IBE/IBSD Ionfab300]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2|Deposition of Silicon Oxide using IBE/IBSD Ionfab300]] | ||