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Specific Process Knowledge/Lithography/LiftOff: Difference between revisions

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Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP.
Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP.


For information on processing of AZ nLOF, see here: [[media:Process_Flow_AZ_nLOF_2020.docx‎|Process_Flow_AZ_nLOF_2020.docx‎]].
For information on processing of AZ nLOF, or image reversal of AZ 5214E, see here: [[Specific_Process_Knowledge/Lithography/UVLithography#Resist_Overview|Resist Overview]].
For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev.docx‎]].


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