Jump to content

Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,315 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,315 edits
Line 112: Line 112:
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|style="background:WhiteSmoke; color:black"|<0.15nm RMS
|-
|style="background:silver; color:black"|
|style="background:LightGrey; color:black"|z accuracy
|style="background:WhiteSmoke; color:black"|better than 2% (at 200 nm)
|style="background:WhiteSmoke; color:black"|better than 2% (at 200 nm)
|-
|-
|style="background:silver; color:black"|
|style="background:silver; color:black"|
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy"