Specific Process Knowledge/Lithography/Strip: Difference between revisions
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===Process Information=== | ===Process Information=== | ||
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher |SiO2 etch using Plasma Asher 1]] | *[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher |SiO2 etch using Plasma Asher 1]] | ||
*[[Specific Process Knowledge/Lithography/Descum|Descum]] | |||
==Plasma Asher 2== | ==Plasma Asher 2== | ||