Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
| Line 40: | Line 40: | ||
*[[/ZnO deposition using ALD|ZnO deposition using ALD 1]] | *[[/ZnO deposition using ALD|ZnO deposition using ALD 1]] | ||
*[[/AZO deposition using ALD|Al-doped ZnO (AZO) deposition using ALD 1]] | *[[/AZO deposition using ALD|Al-doped ZnO (AZO) deposition using ALD 1]] | ||
*[[/HfO2 deposition using ALD|HfO<sub>2</sub> deposition using ALD 1]] | <!--*[[/HfO2 deposition using ALD|HfO<sub>2</sub> deposition using ALD 1]]--> | ||
*[[/HfO2 deposition using ALD new page|HfO<sub>2</sub> deposition using ALD 1 new page]] | *[[/HfO2 deposition using ALD new page|HfO<sub>2</sub> deposition using ALD 1 new page]] | ||